TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. (AMAT) today unveiled a breakthrough in patterning technology that allows chipmakers to create high-performance ...

Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are ...

Even as 28-nm production is ironed out, 20 nm is coming on, bringing with it double-patterning lithography and changes to design-rule checking and other verification parameters. Mentor Graphics' ...