The self-assembly of block copolymer thin films can generate dense nanoscale patterns over large areas 1,2,3,4,5,6,7,8. When directed by a sparse topographic or chemical template, the block copolymers ...
A technical paper titled “Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly” was published by researchers at Tokyo Institute of Technology and Tokyo ...
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