SANTA CLARA, Calif. — Optical proximity correction (OPC) can take days or weeks for 65 nm ICs, and the problem will only get worse at 45 nm. Hoping to head off a computational nightmare, Mentor ...
DFM startup Aprio Technologies is adding a third offering to its OPC (optical proximity correction) tool lineup with features for creating OPC libraries and for viewing, during IC design, what parts ...
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