SANTA CLARA, Calif. — During the SPIE Microlithography conference here, ASML MaskTools Inc. entered the phase-shift software photomask market with a product that promises to extend optical lithography ...
New research paper titled “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” from researchers at Fraunhofer-Institut für Integrierte Systeme und ...
SAN JOSE, Calif. — Actinix Inc. has been awarded a Phase II grant from the National Science Foundation (NSF) to complete the development of its phase-shift metrology system for advanced photomasks ...
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